Inductively Coupled Plasma
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Inductively Coupled Plasma Spectroscopy (ICP-OES/MS), ICP Analysis Services
ICP-OES measures the light emitted at element-specific characteristic wavelengths from thermally excited analyte ions . This light emitted is separated and measured in a spectrometer, yielding an intensity measurement that can be converted to an elemental concentration by comparison with calibration standards. ICP-MS (ICP-Mass Spec) measures the masses of the element ions generated by the high temperature argon plasma. The ions created in the plasma are separated by their mass to charge ratios, enabling the identifcation and quantitation of unknown materials. ICP-MS offers extremely high sensitivity (i.e. low detection limits) for a wide range of elements
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Inductively Coupled Plasma Emission Spectroscopy
Inductively Coupled Plasma Emission Spectroscopy
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Inductively Coupled Plasma Mass Spectrometer
ICPMS-2030
With its newly developed collision cell and optimized internal structure, the ICPMS-2030 provides superior sensitivity. At the same time, thanks to the adoption of its proprietary mini-torch unit and provision of an Eco mode, the quantity of argon gas needed for analyses has been greatly reduced to the industry's lowest levels. As a result, low running costs are assured. The Development Assistant function of the software automatically sets the optimal analysis conditions for quantitative analysis. Then, after measurements are complete, the Diagnosis Assistant function automatically checks the validity of the necessary data. While reducing the burden on the user, the efficiency of analyses is enhanced and the reliability of the data can be increased. It complies with FDA 21 CFR Part 11.
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Inductively Coupled Plasma Optical Emission Spectroscopy / ICP-OES Systems
Industry-leading performance, speed and ease of use – no compromises
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Chemical Analysis and Corrosion Testing
Performing chemical analysis of metal alloys including both ferrous and non-ferrous alloys.Chemical analysis involves determining the chemical constituents of metals and related materials.An industry leader and co-operating laboratory for qualifying Calibration Standards for Chemical Analysis.Our chemical laboratory processes include Spectroscopy – Optical Emission Inductively Coupled Plasma, gas analysers, wet chemical, Intercrystalline/ Intergranular Corrosion (including G28, G48 etc).
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Inductively Coupled Plasma Spectrometry
Is an analytical technique that can be used to measure elements at trace levels in biological fluids.
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Inductively Coupled Plasma
Inductively Coupled Plasma Techniques can be very powerful tools for detecting and analyzing trace and ultra-trace elements. Over the past years, ICP-MS has become the technique of choice in many analytical laboratories for providing the accurate and precise measurements needed for today’s demanding applications and for providing required lower limits of detection.
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Inductively Coupled Plasma Mass Spectrometry / ICP-MS Systems
Agilent ICP-MS systems utilize innovative technology to deliver excellent sensitivity, accuracy, ease of use and productivity. Our 7800 and 7900 quadrupole ICP-MS systems offer the highest matrix tolerance, widest dynamic range and most effective interference removal for trace elements across most typical applications. The 8900 Triple Quadrupole ICP-MS (ICP-QQQ) adds MS/MS operation, providing precise control of reaction cell processes to ensure the most consistent and accurate results, resolving interferences that are beyond the capability of quadrupole and sector-field high resolution ICP-MS.
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ICP Plasma System
The AXIC IsoLok® Inductively Coupled Plasma (ICP) Load-Locked Processing System from AXIC, Inc. defines a new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low damage Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) plasma processing. The system is based on a modular design starting with a universal chamber and cabinet unit with ICP etch or deposition bottom electrodes available for easy installation into the chamber unit combined with a load-lock. We are confident you will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma product in the market.
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Threaded Coupling Adapter, G2, G6, G10, ITA, For Conduit Harnessing Assemblies/Clamps
410112599
The Adapter is designed to accommodate military and commercial circular backshells for conduit or strain relief when designing for general and heavy-duty applications. The male thread size is 1.625-18 for this application.
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HV Coupling Capacitors
Our high-voltage coupling capacitors are a main component of our partial discharge test stations. They serve to decouple the partial discharge impulses and act as a voltage divider, the output voltage of which is matched to our partial discharge measuring devices (with integrated voltage measurement) and peak voltage measuring devices. These high-voltage components are also available separately in their various designs, sizes, capacities and voltage ranges.
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Hose Couplings
WITT quick couplers / hose couplings SK100 for gases provide a safe, quick and distinctive connection of the hose with outlet points or working equipment.An automatic cut-off valve prevents any gas flow when disconnected. WITT hose couplings have an integrated non-return valves which prevents the formation of explosive gas mixtures in the pipeline.
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Inductive Sensors
Inductive Proximity Switches, self contained, depend on the output of an oscillator for their operation. The oscillator resonant circuit uses an open core coil to produce a concentrated high frequency electromagnetic (RF) field, which emerges from the active surface of the sensor. If a metal target (or other electrically conductive material) enters this field, eddy currents will be induced in it, causing the resonating oscillator to be damped.
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Coupling Decoupling Network
TBCDN-M2
The TBCDN-M2 is a Coupling Decoupling Network for conducted immunity testing according to IEC 61000-4-6.
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Plasma Processing Systems
PlasmaSTAR
The PlasmaSTAR® Series of Plasma Processing Systems from Axic, Inc. defines a new concept in barrel plasma processing. The systems are based on a modular design concept. Starting with a universal base unit, multiple electrode modules are available for easy insertion into the base unit. You will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma.
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Inductive Motor Control
The inductive motor control position sensor family detects the electrical position within one pole-pair of a rotating shaft and can be used for the motor commutation of a brush-less DC (BLDC) motor. Based on the inductive sensor technology, this family measures the coupling between an excitation coil (TX) and two receiver coils (RX) via a rotating target. The coils are executed as printed circuit coils and the rotating target is a simple punched metal part. With the correct layout of the coils and the target, both synchronized to the number of pole-pair count of the motor, the IC output is proportional to the electrical angular position within one pole-pair segment with increased resolution and high performance of only 0.3° electrical INL!
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Versatile AFM Optical Coupling
TRIOS
The TRIOS platform is an advanced research instrument that provides the entry path for researchers in materials science, biology, spectroscopy and photonics. TRIOS is the most versatile optical coupling platform providing three ports for optical spectroscopy measurements with top-down, side (oblique) and inverted accesses to the AFM tip and sample.If you work with opaque and/or transparent samples, either in air or in liquid looking at nanoscale structures and near-field optical properties investigation, the TRIOS platform is the right solution for you. It perfectly combines upright optical, inverted optical, and atomic force microscopies, and unleash all the power of both techniques providing instrument adjustment and measurement automation, high resolution and integration flexibility. Such performance is only available from HORIBA.
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Capacitance and Inductance Tester
JY6700
Capacitance measurementsInstrument can test take a single capacitor without stitches in test group capacitance to bring convenience to test. It will show test results of capacitance while show test
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Inductance Capacitance Meters
A piece of electronic test equipment used to measure capacitance, mainly of discrete capacitors.
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Remote Plasma Sources
Semiconductor and Electronic Thin Film applications use plasma sources to generate low-energy ions and radicals to react with material surfaces and chamber walls to remove contaminants and act as a precursor to aid in material deposition. MKS provides multiple options for radical generation including Toroidal and Microwave based Remote Plasma Sources supporting Fluorine, NF3, oxygen, nitrogen and hydrogen process chemistries.
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Time-domain Field-Device-Circuit coupled simulator
EM-SUPREME®
Time-domain Field-Device-Circuit coupled simulator for modeling of passive structures, active components, and complete RF & millimeter-wave modules. EM-Supreme is used for EM modeling of power amplifiers, switches, filters, active antennas, and complete RF modules such as antenna-switch, switch-filter, switch-filter-amplifier, and front-end modules with no approximations.
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Micro-size Inductive Proximity Sensor
GXL
Panasonic Industrial Devices Sales Company of America
Panasonic cube-shaped GXL Micro-Size Inductive Proximity Sensors are extremely small. Each Sensor is available in four different versions: front or side sensing with normally open or normally closed contacts and offering two detection frequencies to prevent mutual interference.Characteristics
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Digital Displacement Inductive Sensor
EX-V Series
High-speed, high-accuracy, digital inductive displacement sensors with sub-micron resolution and an ultra-fast 40,000 samples/sec. sampling rate. Automatic Bottom-dead-center measurement mode. High-speed sampling : 40,000 samples/second. Digital Inductive Displacement Sensor
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Inductive Sensors
Our hygienic sensors are extremely durable against abrasive and aggressive media: their labeling is resistant to abrasion and chemicals. The luminous displays are protected against destruction and the housing construction is optimized for safe cleaning.
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Inductive Load Banks
L-Series
L-series inductive load banks are devices which contain inductive loads, apply the load to an electrical power source and dissipate the reactive power of the electrical source. L-series load banks are designed for portable and fixed applications. Hilkar brand L-series load banks have robust design and are specifically designed for corrosive environments. Load banks can be controlled via local, remote, wireless remote or automatic control systems.
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Plasma Power Generators
Advanced Energy’s field-proven, Precision PowerTM solutions offer extreme control, peerless arc handling, and cutting-edge match technology. Unlock new fabrication processes and benefit from our plasma power generators’ comprehensive capabilities.
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Remote Plasma Sources For Process Applications
MKS remote plasma sources deliver high density reactive radicals improving on-wafer cleaning and deposition throughput. Solutions consist of a fully integrated, self-contained unit designed for quick on-chamber installation providing fast, reliable plasma ignition of O2, Hydrogen and Nitrogen gases in a customer configurable package. All solutions are equipped with intelligent power control and EtherCAT® diagnostics supporting Industry 4.0.
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R*evolution® Remote Plasma Source
The innovative R*evolution® Remote Plasma Source combines field-proven, low-field toroidal plasma technology with an actively cooled plasma chamber made of high purity quartz, significantly reducing oxygen, hydrogen and nitrogen atomic gas loss through wall recombination. Self-contained and compact, R*evolution delivers up to 10 slm of oxygen radicals from a 6kW power supply with true power accuracy of <1% resulting in a high density, extremely clean radical source for photoresist strip and an optimal clean rate greater than 12 microns/min-1. R*evolution can be used for other surface preparation applications.
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Rectangular-shaped Inductive Proximity Sensor
GX-F/H
Panasonic Industrial Devices Sales Company of America
The GX-F/H Rectangular-Shaped Inductive Proximity Sensor has a very long and stable sensing range among comparable rectangular inductive Proximity Sensors and is easy to install. Precise adjustment and control of sensing sensitivity greatly reduces individual Sensor differences and variations.
