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Inductively Coupled Plasma
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Inductively Coupled Plasma Mass Spectrometer
ICPMS-2030
With its newly developed collision cell and optimized internal structure, the ICPMS-2030 provides superior sensitivity. At the same time, thanks to the adoption of its proprietary mini-torch unit and provision of an Eco mode, the quantity of argon gas needed for analyses has been greatly reduced to the industry's lowest levels. As a result, low running costs are assured. The Development Assistant function of the software automatically sets the optimal analysis conditions for quantitative analysis. Then, after measurements are complete, the Diagnosis Assistant function automatically checks the validity of the necessary data. While reducing the burden on the user, the efficiency of analyses is enhanced and the reliability of the data can be increased. It complies with FDA 21 CFR Part 11.
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Inductively Coupled Plasma Emission Spectroscopy
Inductively Coupled Plasma Emission Spectroscopy
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Inductively Coupled Plasma Mass Spectrometry / ICP-MS Systems
Agilent ICP-MS systems utilize innovative technology to deliver excellent sensitivity, accuracy, ease of use and productivity. Our 7800 and 7900 quadrupole ICP-MS systems offer the highest matrix tolerance, widest dynamic range and most effective interference removal for trace elements across most typical applications. The 8900 Triple Quadrupole ICP-MS (ICP-QQQ) adds MS/MS operation, providing precise control of reaction cell processes to ensure the most consistent and accurate results, resolving interferences that are beyond the capability of quadrupole and sector-field high resolution ICP-MS.
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Inductively Coupled Plasma Spectroscopy (ICP-OES/MS), ICP Analysis Services
ICP-OES measures the light emitted at element-specific characteristic wavelengths from thermally excited analyte ions . This light emitted is separated and measured in a spectrometer, yielding an intensity measurement that can be converted to an elemental concentration by comparison with calibration standards. ICP-MS (ICP-Mass Spec) measures the masses of the element ions generated by the high temperature argon plasma. The ions created in the plasma are separated by their mass to charge ratios, enabling the identifcation and quantitation of unknown materials. ICP-MS offers extremely high sensitivity (i.e. low detection limits) for a wide range of elements
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Inductively Coupled Plasma
Inductively Coupled Plasma Techniques can be very powerful tools for detecting and analyzing trace and ultra-trace elements. Over the past years, ICP-MS has become the technique of choice in many analytical laboratories for providing the accurate and precise measurements needed for today’s demanding applications and for providing required lower limits of detection.
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Inductively Coupled Plasma Optical Emission Spectroscopy / ICP-OES Systems
Industry-leading performance, speed and ease of use – no compromises
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ICP Plasma System
The AXIC IsoLok® Inductively Coupled Plasma (ICP) Load-Locked Processing System from AXIC, Inc. defines a new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low damage Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) plasma processing. The system is based on a modular design starting with a universal chamber and cabinet unit with ICP etch or deposition bottom electrodes available for easy installation into the chamber unit combined with a load-lock. We are confident you will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma product in the market.
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Inductively Coupled Plasma Spectrometry
Is an analytical technique that can be used to measure elements at trace levels in biological fluids.
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Chemical Analysis and Corrosion Testing
Performing chemical analysis of metal alloys including both ferrous and non-ferrous alloys.Chemical analysis involves determining the chemical constituents of metals and related materials.An industry leader and co-operating laboratory for qualifying Calibration Standards for Chemical Analysis.Our chemical laboratory processes include Spectroscopy – Optical Emission Inductively Coupled Plasma, gas analysers, wet chemical, Intercrystalline/ Intergranular Corrosion (including G28, G48 etc).
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Coupling Decoupling Network
TBCDN-M4
The TBCDN-M4 is a Coupling Decoupling Network for conducted immunity testing according to IEC 61000-4-6.
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Remote Plasma Sources
Equip your manufacturing and abatement processes with high functionality and exceptional reliability. Customize your chemistry. Expand your operating range. Deliver higher process rates. Advanced Energy’s remote plasma sources offer sophisticated options in streamlined designs.
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Inductive Sensors (LVDT)
induSENSOR
Micro-Epsilon offers a large range of inductive sensors for displacement and position measurement from conventional LVDT sensors and inductive sensors with integrated controller to customer-specific high-volume versions. The induSENSOR displacement sensors from Micro-Epsilon are used in automated processes, quality assurance, test rigs, hydraulics, pneumatic cylinders and automotive engineering.
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Unclamped Inductive Load Tester
ITC75300
The ITC75300 is a 400 amp version of the ITC75100 which performs ruggedness testing of power MOSFET’s, IGBT’s and diodes that conforms to MIL-STD-750 method 3470 by stressing them to controlled energy levels, accomplished by the devices driving an unclamped inductive load. Improved Test Specifications allow complete control of test parameters.
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HV Coupling Capacitors
Our high-voltage coupling capacitors are a main component of our partial discharge test stations. They serve to decouple the partial discharge impulses and act as a voltage divider, the output voltage of which is matched to our partial discharge measuring devices (with integrated voltage measurement) and peak voltage measuring devices. These high-voltage components are also available separately in their various designs, sizes, capacities and voltage ranges.
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Namur Inductive Proximity Sensor
Shanghai Pubang Sensor Co.,Ltd.
1. NAMUR SENSOR, super low leakage current design2. Eliminate the security risks3. Suitable for inflammable and explosive dangerous areas
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Inductive Coupler
CLAMPMITTER™
The CLAMPMITTER™ is a unique tool for inductive coupling. This self-contained inductive transmitter increases productivity, promotes safety and simplifies locates by condensing the transmitter and inductive coupler into one cordless package. Whether climbing down a manhole or accessing a utility box, the Clampmitter is an easy alternative to suiting up with a full transmitter and wired coupler.
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Inductive Sensors
Inductive Proximity Switches, self contained, depend on the output of an oscillator for their operation. The oscillator resonant circuit uses an open core coil to produce a concentrated high frequency electromagnetic (RF) field, which emerges from the active surface of the sensor. If a metal target (or other electrically conductive material) enters this field, eddy currents will be induced in it, causing the resonating oscillator to be damped.
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DC Coupled Differential Switching System
BS1553F(X)
Universal Switching Corporation
The BS1553F(X) is a modular passive DC coupled differential switching system. It is designed as an automated "patch panel" for interconnecting numerous MIL-STD-1553 devices, cables and hardware, or for routing other differential signals such as '422 clock/data or kelvin ATE measurements. The I/O capacity is scalable from a small 8x8, up to 64x64 in one 5RU unit.
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Remote Plasma Sources
Semiconductor and Electronic Thin Film applications use plasma sources to generate low-energy ions and radicals to react with material surfaces and chamber walls to remove contaminants and act as a precursor to aid in material deposition. MKS provides multiple options for radical generation including Toroidal and Microwave based Remote Plasma Sources supporting Fluorine, NF3, oxygen, nitrogen and hydrogen process chemistries.
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Micro-size Inductive Proximity Sensor
GXL
Panasonic Industrial Devices Sales Company of America
Panasonic cube-shaped GXL Micro-Size Inductive Proximity Sensors are extremely small. Each Sensor is available in four different versions: front or side sensing with normally open or normally closed contacts and offering two detection frequencies to prevent mutual interference.Characteristics
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Coupled Cavity TWTs
Communications & Power Industries
• Frequencies from 2.7 to 37.5 GHz• Peak levels: 500 W to 180 kW• Cooling type: air, liquid, conduction• Depressed or grounded collectors• CW (Continuous Wave) and Pulsed
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UV Plasma Sources
UVS300|UVS 10/35
The UVS300 and UVS 10/35 are UV Plasma sources with high intensity, working with different gases.
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Inductive Sensors
*Wide operating temperature range*High protection rating for the requirements of harsh industrial environments*Reliable detection due to low sensor tolerances*Reduced inventory due to wide range of applications
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Coupling Decoupling Network for Communication Lines
CDN61000-5C
• Application Range: ≤4kV, 1.2/50us pulse, 8 wire unshielded twisted pair (UTP) • Test Voltage: Max 4KV, 2 kV (1.2/50 µs pulse when RJ45 connector is connected. Maximum test voltage is 1.5kV when RJ45 female is unconnected or auxiliary terminal is not protected.) • Coupling mode: 90V gas- discharge tube+250ohm Resistor/Each Wire, 8 Wires Simultaneously-Ground (Common Mode) • Input and output interface: RJ45 connector • Terminal layout (RJ45 connector): First pair of lines: pins 1/2 Second pair of lines: pins3/6 Third pair of lines: pins 4/5 Fourth pair of lines: pins 7/8 • Max. operating speed: 1000MBit/s • Max operating voltage: Max 50V DC • Max operating current: Max 1A Related Instruments
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