Plasma
An ionized gas used for flat panel displays.
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Product
GHW Series 13.56 MHz, 1.25, 2.5, And 5.0 KW High-Reliability RF Plasma Generators
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The GHW Series RF power generators deliver maximum rated output powers of 1250, 2500 and 5000 Watts at a frequency of 13.56 MHz. The GHW generators offer field-proven reliability, exceptional stability, and unsurpassed repeatability for high uptime and process yield. They are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
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Product
Plasma-Enhanced Chemical Vapor Deposition (PECVD)
VECTOR Product Family
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Dielectric film deposition processes are used to form some of the most difficult-to-produce insulating layers in a semiconductor device, including those used in the latest transistors and 3D structures. In some applications, these films need to conform tightly around intricate structures. Other applications require dielectric films to be exceptionally smooth and defect free since slight imperfections are multiplied greatly in subsequent layers.
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Product
Principle Of Optical Emission Spectrometry
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Optical emission spectrometry involves applying electrical energy in the form of spark generated between an electrode and a metal sample, whereby the vaporized atoms are brought to a high energy state within a so-called "discharge plasma".
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Product
High-Power Density
Apex
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The versatile Apex® family of RF generators and power-delivery systems showcases a compact, modular design suitable for chamber mounting. Utilizing sophisticated RF-conversion technology, Apex RF generators and power-delivery systems offer enhanced product and process reliability. High-density power capabilities make them ideal for advanced plasma processes. And various communications models and configurable features allow you to customize your platform and explore integration approaches. No custom generator lead times are necessary.
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Product
Streak Camera
OptoScope SC-20 systems
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The SC-20 streak camera system is characterized by its large detection area of 35 mm x 4 mm and a large usable screen diagonal of 40 mm. Signals are mapped onto the fiber optic input window and measured without the need for optical reduction. In the simplest case, the entrance optics consists of a slit mask that lies directly on the entrance window. In addition, a flexible extension with a shutter, a lens mount or an adjustable slot with coupling optics is possible. The time resolution in the sub-nanosecond range qualifies the camera for many applications in detonics and plasma physics.
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Product
Post Dicing
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Camtek offers dedicated inspection and metrology solutions for dicing-related processes, ensuring the reliability of the end product. Camtek developed new capabilities to address new dicing technologies such as Stealth and Plasma dicing using new algorithmic and technologies such as Back Light illumination, as well as various handling solutions.
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Product
Matching Network Solution
Navio
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Experience simplicity and high reliability in a single, affordable package. The Navio™ matching network leverages our power expertise to precisely match complex plasma impedance to your tuning range. It’s quick, accurate, and repeatable. Available in multiple power ranges and frequencies, choose from a standard offering or a configurable design. Installation is virtually plug-and-play with Advanced Energy’s RF power supplies. Virtual Front Panel software is available for monitoring.
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Product
Long Focal Length Spectrometer
1000M Series
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The M Series II monochromators are the large focal length monochromators of choice for the most demanding spectroscopy applications such as Raman, Plasma Emission, LIBS and others. With a spectral resolution down to 0.006 nm and an optional dual automated entrance and exit ports, the M Series II monochromators are the most versatile spectrometers in their market space. These monochromators also benefit from the highest quality of gratings, also designed and manufactured by HORIBA. The M Series is the ultimate spectrometer for ultra-high spectral resolution down to 0.006 nm.
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Product
Desolvating Nebulizer
Aridus3
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The CETAC Aridus3 Desolvating Nebulizer System is a specialized liquid sample introduction accessory for inductively coupled plasma mass spectrometry (ICP‑MS). The Aridus3 can enhance analyte sensitivity up to 10 times or more and can greatly reduce solvent-based interferences such as oxides and hydrides.The Aridus3 couples a low-flow (50, 100, or 200 µL/min) PFA nebulizer and a heated PFA spray chamber with an inert fluoropolymer membrane. This combination provides enhanced analyte sensitivity while reducing solvent based interferences such as oxides and hydrides. The Aridus3 is particularly advantageous for small volume and highly corrosive samples such as those generated in the earth sciences and the semiconductor industry.
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Product
Microwave Plasma Atomic Emission Spectroscopy / MP-AES Systems
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Agilent’s industry-leading microwave plasma-atomic emission spectrometer (MP-AES) systems are powerful, cost-efficient and easy-to-use for a wide range of applications from routine analysis to complex precious metals analysis. By running on air, Agilent MP-AES systems both cost less and are safer than alternative methods that rely on flammable gases. The innovative Agilent 4210 MP-AES system offers higher sensitivity and faster throughput capabilities than flame atomic absorption.
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Product
Empowering Traditional Mass Spec
ZipChip
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The ZipChip™ separations platform uses integrated microfluidic technology to prepare, separate and electrospray biological samples directly into traditional mass spectrometers (MS). In less than 3 minutes per sample, the cost-effective ZipChip system enables analysis of a broad range of matrices from growth media to cell lysates, blood, plasma, urine, and biopharma products. Each chip provides answers on analytes from small molecules up to intact proteins, antibodies and antibody drug conjugates (ADCs). This platform provides better separation quality than most liquid chromatography (LC) instruments – in a fraction of the time – all with full MS identification behind every separations peak.
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Product
R*evolution® Remote Plasma Source
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The innovative R*evolution® Remote Plasma Source combines field-proven, low-field toroidal plasma technology with an actively cooled plasma chamber made of high purity quartz, significantly reducing oxygen, hydrogen and nitrogen atomic gas loss through wall recombination. Self-contained and compact, R*evolution delivers up to 10 slm of oxygen radicals from a 6kW power supply with true power accuracy of <1% resulting in a high density, extremely clean radical source for photoresist strip and an optimal clean rate greater than 12 microns/min-1. R*evolution can be used for other surface preparation applications.
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Product
Die-To-Wafer Bonding Systems
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Several different D2W bonding methods are available and selected depending upon the application and customer requirements. In direct placement D2W (DP-D2W) bonding, the singulated dies are bonded to the target wafer one by one using a pick-and-place flip-chip bonder. Plasma activation and cleaning of the surfaces of the dies on the handler wafer are essential steps for establishing a high-yielding bond and electrical interface between the dies and target wafer. This is where the EVG320 D2W activation system comes in.
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Product
In Situ Diagnostics
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For researchers working on ultra thin films and novel interfaces, Neocera offers insitu, real-time process control and diagnostic tools such as high-pressure RHEED, Low Angle X-ray Spectroscopy (LAXS) and Ion Energy Spectroscopy (IES). RHEED provides exceptional growth control via RHEED intensity oscillations and the Structural data via diffraction. LAXS is a complimentary to RHEED and provides real-time Compositional information. IES provides energetics of the laser generated plasma plume which is directly responsible for obtaining high quality films and interfaces.
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Product
OES Spectrometers
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OES Spectrometers (Optical Emission Spectrometers for OEMs) optimized for SEMICON applications including plasma monitoring/end-point detection and reflectometry (with the addition of a flash lamp). The OES-Star features unmatched throughput and SNR, spectral coverage and < 1 nm resolution). Our new OES Family, OES-Star, VS70-MC and InVizU all include our latest “Multi-Communications interface” electronics (MC= EtherCAT, Ethernet, USB-2). The Invizu integrates both a linear CMOS sensor for UV-VIS and a TE-Cooled INGAAS sensor, which extends the spectral coverage to 1700 nm.
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Product
Monitor Holder for 19" Rack Installation
ZZ-0017-01
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- Monitor holder for 19 “rack installation- 9 U (400 mm)- Can be used universally with LED, LCD and plasma monitors- Compatible with the VESA standards 75 x 75 and 100 x 100 mm- Record in portrait and landscape format
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Product
Noise Location Package
Type HFDF
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National RF’s Type HFDF high frequency location system is a proven noise hunting and location directional antenna system that allows you, in many cases, to walk right up to the source of High Frequency (HF) noise! Used by several power companies around the United States, professional noise hunters, and other communications specialists, the HFDF has located noise sources that emanated from pole power transformers, arcing electric fences, CATV in-line amplifiers, plasma TV screens, and even Marijuana grower’s heating lamps! The system incorporates several plug-in, tunable magnetic loop sensors of a proprietary National RF design, that cover the frequency range between 1.8 MHz and 55 MHz. The unit is packaged in a hand-held, lightweight metallic enclosure, with a pistol grip and a magnetic compass mounted on top. The compass is used to get magnetic bearings to the noise source, which may be plotted on a map to triangulate, and ultimately pin-point, the location of the noise source. In certain cases, our customers tell us that they have been able to walk right up to the interfering noise source and correct the situation on the spot!
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Product
Spectrometers, Vacuum
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A compact and versatile vacuum ultraviolet monochromator. A selection of aberration-corrected diffraction gratings is available so you can tailor the instrument to your wavelength of interest and application. Connect this instrument directly to your vacuum plasma physics experiment or build an intense UV tunable source. It is available as a scanning monochromator, as a spectrometer, or as a spectrograph with microchannel plate or direct-detection CCD. The Model 234/302 is popular in systems due to its compact design, high throughput and resolution. It is also available with an additional entrance or exit port.
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Product
Inductively Coupled Plasma Mass Spectrometer
ICPMS-2030
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With its newly developed collision cell and optimized internal structure, the ICPMS-2030 provides superior sensitivity. At the same time, thanks to the adoption of its proprietary mini-torch unit and provision of an Eco mode, the quantity of argon gas needed for analyses has been greatly reduced to the industry's lowest levels. As a result, low running costs are assured. The Development Assistant function of the software automatically sets the optimal analysis conditions for quantitative analysis. Then, after measurements are complete, the Diagnosis Assistant function automatically checks the validity of the necessary data. While reducing the burden on the user, the efficiency of analyses is enhanced and the reliability of the data can be increased. It complies with FDA 21 CFR Part 11.
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Product
Plasma Process Monitors
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Plasma process monitors to monitor plasma emissions during semiconductor manufacturing processes such as etching, sputtering and CVD.
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Product
Thin-film deposition
Plasma Source
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SPECS Surface Nano Analysis GmbH
Thin-film deposition covers any technique for depositing material onto a bulk or thin film substrate. Elemental alloy or compound films are produced by non-reactive or reactive (co-)deposition. Often functionalization or tailoring of device interfaces by predeposition or deposition assisting surface treatment with atoms or ions is necessary.
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Product
Enable Non-Invasive Analysis
Sparklike Handheld™
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Sparklike Handheld™ is practical and quick method to test IG gas concentration. Technology is based on plasma emission spectroscopy. A high voltage spark is launched in the IG unit's cavity causing a light emission which is observed and analyzed further.
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Product
Process Sense™ NDIR End Point Detector For Chamber Clean
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The Process Sense endpoint sensor is a small, low-cost SiF4 sensor specifically designed for Remote Plasma Chamber Clean Endpoint detection for silicon-based CVD deposition chambers. Process Sense is based on infrared absorption, the only technique applicable to all plasma cleaning processes (in-situ and remote). It gets mounted onto a bypass on the rough line, ensuring no effect on deposition hardware. The signal level reported by the Process Sense, which is proportional to SiF4 concentration, can be used to determine the completion of the chamber clean process.
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Product
Inductively Coupled Plasma Emission Spectroscopy
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Inductively Coupled Plasma Emission Spectroscopy
