MKS Instruments
MKS Instruments, Inc. is a global provider of instruments, subsystems and process control solutions that measure, control, power, monitor, and analyze critical parameters of advanced manufacturing processes to improve process performance and productivity.
- 978-645-5500
- 2 Tech Drive
Suite 201
Andover, MA 01810
United States of America
Categories
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Residual Gas Analyzers
Residual Gas Analyzers are an effective tool to analyze system gas loads resulting from real leaks, virtual leaks or chamber wall outgassing. RGAs have a number of advantages over traditional, dedicated gas leak detectors including the ability to differentiate between different gas species, comparable sensitivity levels, the ability to detect internal or "virtual" leaks and to detect and analyze outgassing problems.
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R*evolution® Remote Plasma Source
The innovative R*evolution® Remote Plasma Source combines field-proven, low-field toroidal plasma technology with an actively cooled plasma chamber made of high purity quartz, significantly reducing oxygen, hydrogen and nitrogen atomic gas loss through wall recombination. Self-contained and compact, R*evolution delivers up to 10 slm of oxygen radicals from a 6kW power supply with true power accuracy of <1% resulting in a high density, extremely clean radical source for photoresist strip and an optimal clean rate greater than 12 microns/min-1. R*evolution can be used for other surface preparation applications.
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Automation Controllers And Modules
Our complete automation platform solution along with a suite of automation control hardware and software configurable modules allow semiconductor and other industrial manufacturing customers to better automate their processes through computer-controlled automation and seamlessly integrate with existing MKS products to provide a complete solution.
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High Flow Mass Flow Controllers
High flow thermal mass flow controllers and meters offer both elastomer and metal seals for flow rates up to 300 slm. Versions are available for standard and harsh environments where protection from water and dust is required.
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Industrial Differential Pressure Transducers
These industrial Baratron® capacitance manometers feature differential pressure measurement, industrial enclosures, and higher operating temperature ranges for industrial applications.
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Communication Gateways
We offer compact gateways for DeviceNet™, Profibus™ and Ethernet communication protocols available in RS232, RS422, RS485 and Modbus interfaces for communicating with our programmable automation controllers and networked I/O.
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General Performance Pressure Transducers And Switches
These general performance Baratron® capacitance manometers are available as pressure transducers with an analog signal proportional to absolute or differential pressure, or as switches with relay outputs based on pressure.
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FTIR Gas Analyzers
FTIR Spectroscopy gas analyzer instruments from MKS Instruments are capable of ppb to ppm sensitivity for multiple gas species in a variety of gas analysis applications, such as toxic gas detection, automotive emissions measurement, and monitoring stack emissions, processes, ambient air, purity, and selective catalytic reduction performance.
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High-concentration, High Flow Ozone Generator
SEMOZON® AX8407
The SEMOZON AX8407 generator converts pure oxygen into ozone through silent electrical discharge and achieves high output and high concentration level. It requires only minute levels of dopant nitrogen gas, far below the levels required for competitive ozone generators. As a result, the presence of contaminants, e.g. NOx compounds, is extremely low.
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Mass Spectrometers
Our wide range of powerful, versatile, and proven mass spectrometry-based solutions deliver a new level of understanding and control in vacuum and gas-related applications to customers.
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Process Sense™ NDIR End Point Detector For Chamber Clean
The Process Sense endpoint sensor is a small, low-cost SiF4 sensor specifically designed for Remote Plasma Chamber Clean Endpoint detection for silicon-based CVD deposition chambers. Process Sense is based on infrared absorption, the only technique applicable to all plasma cleaning processes (in-situ and remote). It gets mounted onto a bypass on the rough line, ensuring no effect on deposition hardware. The signal level reported by the Process Sense, which is proportional to SiF4 concentration, can be used to determine the completion of the chamber clean process.
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Remote Plasma Sources For Process Applications
MKS remote plasma sources deliver high density reactive radicals improving on-wafer cleaning and deposition throughput. Solutions consist of a fully integrated, self-contained unit designed for quick on-chamber installation providing fast, reliable plasma ignition of O2, Hydrogen and Nitrogen gases in a customer configurable package. All solutions are equipped with intelligent power control and EtherCAT® diagnostics supporting Industry 4.0.
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Ozone Generators & Systems
MKS offers a wide range of ozone generators and modular delivery systems which produce ultra-pure, reliable ozone gas. In the clean semiconductor environment, Ozone reacts with a wide range of precursor gases resulting in the creation of Al2O3, ZrO2, HfO2, and La2O3 metal oxides to enable thin film deposition processes like Atomic Layer Deposition (ALD) and Etch (ALE). MKS’ generator uses Grade 6 gas, enabling the creation of higher film density improving product yield. Photovoltaic and Display manufacturing leverage semiconductor best practices and utilize ozone to create enhanced thin film barriers, improving product performance and reliability.
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Industrial Pressure Transducers
These industrial Baratron® capacitance manometers feature industrial enclosures and higher operating temperature ranges for industrial pressure measurement applications.


















