MKS Instruments
MKS Instruments, Inc. is a global provider of instruments, subsystems and process control solutions that measure, control, power, monitor, and analyze critical parameters of advanced manufacturing processes to improve process performance and productivity.
- 978-645-5500
- 2 Tech Drive
Suite 201
Andover, MA 01810
United States of America
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Product
General Performance Differential Pressure Transducers
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These general performance Baratron® differential capacitance manometers measure the difference in pressure between the inlet tube and the reference cavity. The reference cavity can be connected to any pressure or vacuum source, or be open to local atmosphere.
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Product
Elite™ 13.56 MHz RF Plasma Generators
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The elite™ Series of RF plasma generators provides state-of-the art technology in a compact air-cooled package. The elite is designed with high speed closed loop control, a class E RF deck and a switching modulator for superior output performance. The elite design utilizes a single printed circuit board assembly for the full rack product virtually eliminating all internal wires and connectors and thereby providing the highest reliability available.
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Product
Advanced IR Gas Analyzer For Process Monitoring
T-Series
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T-Series Inline Gas Analyzer improves gas measurement accuracy over the traditional non-dispersive infrared (NDIR) analyzers using Tunable Filter Spectroscopy (TFS™), a spectroscopic scanning technique capable of generating slices of spectra in the infrared region. Each scan produces an absorption spectrum which is used to identify compounds and provide concentration values. TFS technology improves gas identification accuracy and selectivity by subtracting out spectra from interferent gases within the same infrared regions. This spectral processing capability also provides multi-component measurement.
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Product
Compact Pressure Switches
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These vacuum pressure switches based on Baratron® capacitance manometer technology provide relay outputs that are readily interfaced with alarms, valve actuators, computers, process controllers, load locks and other protection devices.
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Product
Vapor Source Mass Flow Controller With Viscous Laminar Flow
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The 1152C Vapor Source Mass Flow Controller is a pressure-based measurement and control system designed to meter and control vapor from low vapor pressure liquid and solid sources directly, without the need of a carrier gas. The 1152C consists of a fixed flow element and two capacitance manometers for flow measurement, with a proportioning solenoid control valve for flow control.
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Product
High Performance Mass Flow Controllers
P-Series
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P-Series High Performance Multi-gas, Multi-range, Thermal Mass Flow Controllers are designed for the most critical process applications where accuracy, repeatability as well as pressure insensitivity are requirements.
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Product
Vapor Source Mass Flow Controller With Viscous Choked Flow
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The 1150C Vapor Source Mass Flow Controllers are pressure based measurement and control systems designed to meter and control vapor from low vapor pressure liquid and solid sources directly, without the need of a carrier gas using viscous flow through a choked orifice.
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Product
Atmospheric Pressure Gas Analyzers
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The Cirrus™ single-quadrupole mass spectrometers are powerful analytical tools for a wide range of laboratory and industry-based gas analysis applications. The Cirrus family, featuring the Cirrus™ 3 and Cirrus™ 3-XD atmospheric pressure gas monitoring systems are ideal for analysis of bulk gas, gas composition, and detection of trace gasses and contamination. These powerful, versatile and customizable platforms, when combined with Process Eye™ Professional software and its recipe-based control, can significantly boost your productivity.
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Product
Compact Pressure Transducers And Switches
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Compact Baratron® capacitance manometers are ideal for space constrained applications. Compact pressure transducers provide an analog output proportional to pressure, while compact pressure switches provide a relay output based on pressure.
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Product
Micro-Baratron® Pressure Transducers
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Micro-Baratron® pressure transducers are ideally suited for use in delivery systems that feed ultrapure gases to critical process systems. Their wetted surfaces exposed to the gas stream have a finish of better than 5 µin Ra. These transducers exhibit superior dry-down characteristics, and contribute no particles above background.
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Product
Automation Controllers And Modules
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Our complete automation platform solution along with a suite of automation control hardware and software configurable modules allow semiconductor and other industrial manufacturing customers to better automate their processes through computer-controlled automation and seamlessly integrate with existing MKS products to provide a complete solution.
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Product
Compact Ultrafast 50-50,000 sccm Mass Flow Controller/Meter
C-Series
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The C-Series Mass Flow Controller (MFC) is a compact, fast-response model using a Micro-Electro-Mechanical Systems (MEMS) based flow sensor for non-corrosive gas applications. It is available in Full Scale flow rates from 50 sccm to 50 slm (N2 equivalent) with a control range from as low as 0.1% of Full Scale up to 100% of Full Scale and is also available as a flow meter. Analog (0 to 5 VDC) or digital (RS485 or Modbus TCP/IP) communications interfaces are available. Required power supply voltage is 24 VDC nominal.
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Product
Industrial Pressure Transducers
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These industrial Baratron® capacitance manometers feature industrial enclosures and higher operating temperature ranges for industrial pressure measurement applications.
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Product
High Power Microwave Plasma Source
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The High Power Microwave Plasma Source can be combined with a 6kW microwave generator for a high concentration of radicals providing a high productivity manufacturing solution. The High Power Microwave Plasma source is capable of igniting in multiple process gases, over a wide operating range with performance benefits in current and emerging applications such as, high throughput photoresist removal, advanced surface cleaning and conditioning, as well as, advanced deposition applications at the atomic level.


















