Heidelberg Instruments
Founded in 1984, Heidelberg Instruments is a global leader in high-precision laser lithography, maskless aligners, and nanofabrication tools. With over 1,500 systems installed in more than 50 countries, our technology powers micro- and nanoscale surface structuring. Our systems range from compact tabletop tools to advanced photomask production equipment and are trusted by leading universities, R&D institutes, and industrial customers worldwide. They enable innovation in fields such as micro-optics, photonics, semiconductors, quantum technologies, MEMS, microfluidics, and 2D materials. We build long-term partnerships with our customers, offering dedicated support throughout each system’s lifetime. By continuously advancing our expertise in mechanics, optics, electronics, and software, we deliver cutting-edge solutions that go beyond the limits of conventional lithography. Heidelberg Instruments is part of the LAB14 Group, a network of high-tech companies driving innovation in micro- and nanofabrication and surface analysis.
- +49 6221 728899 0
- info@heidelberg-instruments.com
- sales@heidelberg-instruments.com
- Mittelgewannweg 27
Heidelberg, Baden-Württemberg 69123
Germany
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Product
VPG⁺ 1400/1850 FPD Volume Pattern Generators
VPG⁺ 1400 FPD / VPG⁺ 1850 FPD
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The VPG⁺ 1400 FPD and VPG⁺ 1850 FPD stand at the forefront of photomask production technology for large substrates, particularly in display applications. Specifically engineered for high-volume production, these advanced volume pattern generators are capable of producing high-quality exposures with exceptional precision. Designed to handle substrates up to G8 and G8.6 sizes, they maximize alignment accuracy and exposure speed, boasting a substantial maximum exposure area and optimized operational capabilities for large-area photomask applications.
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Product
MLA 300 Maskless Aligner
MLA 300
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The MLA 300 Maskless Aligner is engineered for high-volume production, delivering exceptional flexibility and precision in the realm of industrial lithography. This innovative tool supports wafers up to 300 x 300 mm and is capable of dynamically adjusting to surface variations, effectively eliminating the need for costly and time-consuming mask production. By employing direct data exposure instead of traditional masks, the MLA 300 provides advanced solutions for complex lithography challenges, including those encountered in advanced packaging, sensor calibration, and MEMS fabrication. With its high throughput of up to 18,000 mm²/min and resolution down to 1.5 μm, it streamlines workflows and integrates seamlessly with manufacturing execution systems (MES), making it the preferred choice for a broad range of applications like microfluidic devices and other cutting-edge technologies.
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Product
MLA 150 Maskless Aligner
MLA 150
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The MLA 150 Maskless Aligner is poised to revolutionize photolithography by offering an advanced, fast, and flexible solution that replaces traditional photomask techniques. With its high-resolution capabilities providing sub-micron accuracy, this aligner is designed for efficiency, making it ideal for rapid prototyping, advanced research, and low to mid-volume production. By utilizing a two-dimensional spatial light modulator (SLM), the MLA 150 directly exposes the resist-coated wafer, facilitating an unmatched ease of use and operational performance. Its application spans various sectors including MEMS, micro-optics, sensors, and electronic components, highlighting its versatility and effectiveness in nanofabrication environments.
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Product
DWL 2000/4000 GS Laser Lithography Systems
DWL 2000 GS / DWL 4000 GS
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The DWL 2000 GS / DWL 4000 GS Laser Lithography systems are state-of-the-art pattern generators renowned for their speed and flexibility. These systems leverage advanced grayscale lithography technology that not only complies with the highest industrial standards but also generates complex 2.5D topographies essential for micro-optical applications.
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Product
VPG 300 DI Maskless Stepper
VPG 300 DI
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The VPG 300 DI is an innovative direct write lithography system that redefines the capabilities of microfabrication. Tailored specifically for high-resolution applications, the VPG 300 DI seamlessly integrates the precision of traditional i-line steppers with the advantages of a maskless workflow. Leveraging an ultra-high-speed exposure optical engine, this system accelerates the innovation cycle from weeks to mere hours while maintaining exceptional imaging quality and patterning accuracy. With a minimum feature size as small as 500 nm, this state-of-the-art equipment is engineered to meet the rigorous demands of both industrial environments and academic research.
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Product
µMLA Maskless Aligner
µMLA
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The µMLA Maskless Aligner represents the pinnacle of tabletop maskless lithography technology, continuing the legacy of innovation established by the MLA family since its inception in 2015. As the entry-level solution built on the advanced µPG platform, it provides unmatched customization and flexibility, making it ideal for research and development applications. With features such as Raster Scan Mode and Vector Scan Mode, users can achieve variable resolution tailored to specific project requirements. This system excels in high-precision microstructuring applications, ranging from microfluidics and sensor fabrication to the intricate patterning of 2D materials and microlens arrays.
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Product
DWL 66⁺ Laser Lithography System
DWL 66⁺
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The DWL 66⁺ Laser Lithography System is a cutting-edge platform that combines advanced grayscale capabilities and the highest resolution available in direct-write laser systems. This machine is expertly designed for research and development in fields such as microelectronics, MEMS, and photonics, providing unparalleled versatility in both direct writing and low-volume mask making. With its minimum feature size of just 200 nm and 65,536 grayscale levels, the DWL 66⁺ surpasses traditional optical lithography solutions, ensuring precise pattern generation for a multitude of applications including sensors, optics, and quantum devices.
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Product
NanoFrazor Nanolithography Tool
NanoFrazor
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The NanoFrazor Nanolithography Tool represents a paradigm shift in nanofabrication, integrating cutting-edge Thermal Scanning Probe Lithography (t-SPL) technology to foster groundbreaking research and innovation in various fields. This versatile and modular system is adept at crafting intricate nanostructures, making it an ideal instrument for exploring quantum devices, 1D/2D materials, and nanoscale device arrays. With its ultrasharp heatable probe tip, the NanoFrazor not only writes but simultaneously inspects complex structures, optimizing patterning parameters in real-time for exceptional precision. The tool excels at creating grayscale patterns with vertical accuracies of less than 1 nm, thanks to its advanced software and noise-insulated design.
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Product
VPG⁺ 200/400/800 Volume Pattern Generators
VPG⁺ 200 / VPG⁺ 400 / VPG⁺ 800
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The VPG⁺ 200, VPG⁺ 400, and VPG⁺ 800 Volume Pattern Generators are advanced lithography systems that cater to meticulous mask manufacturing for i-line resists. Specifically engineered for high-resolution electronic packaging and other demanding applications, these versatile systems adeptly manage substrate sizes ranging from 9" x 9" to an impressive 32" x 32". Each model integrates a cutting-edge high-speed exposure engine, significantly lowering write times while boosting productivity in environments requiring continuous operation. This exceptional functionality allows for the creation of packaging masks, achieving results that meet the stringent line-width uniformity and edge roughness standards demanded in the industry.
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Product
ULTRA Semiconductor Mask Writer
ULTRA
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The ULTRA Semiconductor Mask Writer is a cutting-edge solution designed to meet the demanding requirements of today's semiconductor manufacturing processes. Building on advanced technology from Heidelberg Instruments, this mask writer excels in producing high-precision photomasks essential for microcontrollers, power management ICs, LEDs, IoT devices, photonics, and MEMS. Its high throughput and cost-effective operation significantly enhance yield and profitability, making it an invaluable asset for semiconductor production.
