Focused Ion Beam
A scanning electron microscope with the electron source replaced by a gallium ion gun. Used for fault analysis and modification of modern microchips and semiconductor devices. (http://www.empa.ch)
See Also: Beam
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Focused Ion Beam Scanning Electron Microscopes
FIB-SEMs
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Combine imaging and analytical performance of a high resolution field emission scanning electron microscope (FE-SEM) with the processing ability of a next-generation focused ion beam (FIB).
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Etch System
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When it comes to clean etches, Veeco’s Ion Beam Etch (IBE) systems deliver with sharp control and minimal disruption. Using a focused argon ion beam, this subtractive technique etches nanoscale features with precision, making it a go-to for pattern transfer, layer removal, and surface refinement where edge definition matters most.
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Sputtering Systems
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Known for precision and cleanliness, Veeco Ion Beam Sputtering (IBS) systems are ideal when engineers need tight control over film thickness, composition, and optical performance. Using a focused ion beam, IBS dislodges atoms from a target, depositing them onto a surface in smooth, ultra-uniform layers.
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Microscopy Software/Hardware
ZEISS Atlas 5
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Atlas 5 is your powerful hardware and software package that extends the capacity of your ZEISS scanning electron microscopes (SEM) and ZEISS focused ion beam SEMs (FIB-SEM). Use its efficient navigation and correlation of images from any source, e.g. light- and X-ray microscopes. Take full advantage of high throughput and automated large area imaging. Unique workflows help you to gain a deeper understanding of your sample.
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TEM Lamella Preparation And Volume Imaging Under Cryogenic Conditions
ZEISS Correlative Cryo Workflow
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ZEISS Correlative Cryo Workflow connects widefield, laser scanning, and focused ion beam scanning electron microscopy in a seamless and easy-to-use procedure. The solution provides hardware and software optimized for the needs of correlative cryogenic workflows, from localization of fluorescent macromolecules to high-contrast volume imaging and on-grid lamella thinning for cryo electron tomography.
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Ion Sources
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Veeco offers the most comprehensive array of ion beam sources for a broad range of applications, including the industry's only Linear gridded sources.
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Ion Chromatography
930 Compact IC Flex
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The 930 Compact IC Flex is a versatile ion chromatograph developed with a focus on the requirements of routine users.
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ION 100 Portable Ion Meter
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The new addition to the Environmental Express Oakton product line features updates to measuring water quality easier and faster. The larger LCD display is 2.75 in. by 2.0 in. for a better viewing angle, and has indicators for battery life, stability, and calibration. The ION 100 meter measures pH, mV, ion concentration of 16 commonly measured ions, and temperature. The microprocessor-based meter features automatic calibration, automatic temperature compensation, function setup, self-diagnostics, automatic power-off, and low voltage display. The meter uses advanced digital processing technology, intelligently improving the response time and accuracy of your measurements. Easily switch units among pX, mol/L, and mg/L (ppm).
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Broad-Beam Ion Milling
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Materials Evaluation and Engineering
Ion beam milling is a unique method of sample preparation that complements and significantly extends the capabilities of the traditional microscopy and metallographic laboratories.
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Ion Source Packages
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RBD Instruments provides a wide range of sputter ion sources used for sample cleaning, and depth profiling. No matter what the application, RBD provides the highest performance at the lowest price.
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Ion Beam Milling Systems
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When material specimen surfaces are prepared for SEM or incident light microscopy, the specimen usually undergoes multiple processes until the layer or surface to be analyzed is machined with precision. Leica Microsystems’ workflow solutions for solid state technology cover all steps required for demanding high-quality sample preparation.
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Ion Pumps & Controllers
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Agilent Vacuum (formerly Varian) offers a complete portfolio of VacIon ion pumps that provide various pumping speeds (from 0.4 to 1000 L/s). Agilent also supplies smart combinations titanium sublimation pumps (Ion CombiTSP) and Non-Evaporable Getter (Ion CombiNEG) pumps for clean and vibration-free environments.Agilent ion pumps and controllers can be customized in a number of configurations to satisfy your vacuum requirements. They are the best choice for those applications where stable ultrahigh or extreme-high vacuum (UHV or XHV) conditions are essential, such as: laboratories, large research facilities, medical devices, scanning electron microscopes, and surface analysis tools.
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Ion Blower Nozzles
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VARIO discharge products consist of a separate AC power supply unit for connecting one or more Eltex discharging components. In SINGLE discharging, the voltage generation (power supply unit) is integrated in the bar.
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Capacitors - Beam Lead
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Macom Technology Solutions Holdings Inc.
MACOM’s MMI-9000 and 9100 Series Chip Capacitors feature high stand-off voltage and low dielectric loss leveraging nitride/oxide dielectric layers. Gold bonding surfaces, top and bottom provide ease of bonding and minimum contact resistance. MACOMs beam lead capacitors have high insulation resistance, low dissipation factor, and low temperature coefficient, which are features that produce devices with excellent long-term stability.
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Water-soluble Ion Analyzer
WAGA-100
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Sample gas passes through denuder, and soluble gas will be analyzed by ion chromatograph first; the aerosol will then be inflated and given into ion chromatography to analyze soluble aerosol.
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Beam Bender
10726A
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The Keysight 10726A bends the incoming beam at a 90-degree angle and is designed for beam diameters of 9 mm or less. This bare optic requires a user-supplied mount.
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Ion Beam System
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Veeco's unmatched Ion Beam know-how delivers proven etch and deposition performance enabling the data storage and MEMS markets for decades.
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Carbon Fibre Beam Gauge
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Designed to measure both internal and external diameters and lengths, the high modulus carbon fibre beam is stiff, lightweight and has an extremely low co-efficient of thermal expansion (CTE). Suitable for measuring high accuracy diameters and lengths up to 4000mm+.
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Technology that Focuses on Measurable Safety
Foretify™
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A Measurable Scenario Description Language (M-SDL) used to describe both scenarios and coverage goals at a very high level (soon to be made open) to enable a ‘measurable safety’ ecosystem
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Laser Beam Alignment
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The alignment product line provides full solutions for applications such as: alignment of laser cavities, straightness measurement, machine alignment, wide-bed printers alignment and others. The AlignMeter system simultaneously measures incoming laser beam position (in µm) and angle (in µRad).It is a powerful compact device perfect for alignment monitoring, for testing the drift, centration and beam alignment relative to the outer housing or tube.
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Headlight Beam Testers
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VLT offers a wide range of professional headlight beam testers. From simple manually operated models up to fullly automated robot type machines for use in integrated test lanes.
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Beam Pattern Measurement System
BP100
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The BP100 is purpose-made for luminous intensity measurement of lamps, using a diffusely transmitting screen to provide a flat image that can be measured by an imaging photometer. This is a low cost, versatile solution in comparison to the traditional method of measuring lamp properties as a function of angle of emission, using Goniometers that are often costly and dedicated for one specific measurement.
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ION Meters
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GAOTek offers a wide selection of ion meters for precise calculation of number of ions in various kinds of solutions. These devices determine whether the solutions have positive or negative ion charge. A solution of known concentration is accurately prepared, and its mV value is plotted on a graph of mV vs. concentration to determine the corresponding unknown concentration. These devices are durable and easy to use portable field instruments.
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Ar Gas Cluster Ion Source
GCIS
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The Kratos Ar Gas Cluster Ion Source (GCIS) is optimised for depth profiling organic materials in Arn+ cluster mode and inorganic materials in Ar+ monomer mode, dependent on the operating parameters defined by the user and the type of material to be profiled. In Arn+ ion cluster mode the ions can be accelerated up to a maximum of 20 keV. This enables the successful sputter depth profiling of the widest range of polymer materials to be undertaken. However, Arn+ cluster depth profiling has been shown to give very low sputter yields for inorganic materials. In order to retain the capability of generating depth profiles from this class of materials this ion source can also be operated in the more conventional Ar monomer (Ar+) mode.
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Neutrals, Radicals and Ions Analysis
HPR-60 MBMS
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The Hiden HPR-60 molecular beam mass spectrometer is a compact skimmer inlet MS for the analysis of atmospheric plasma and reactive gas phase intermediates.
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Ion Chromatography
Metrohm IC Driver 2.1 for Empower®
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Software drivers for integrating Metrohm IC instruments in "Empower® 3" made by Waters. One license per computer authorizes the operation of IC systems under "Empower® 3".
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Bending Beam Load Cell
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Futek Advanced Sensor Technology, Inc.
Are the best fit for many measuring tasks. Here, the signal, on principle, depends on the bending moment.
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Beam Bender BK7, Fixed Horizontal-Bend Mount
E1834M
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The E1834M is a beam bender that bends the incoming beam at a 90-degree angle and is designed for beam diameters of 9 mm or less. This referenced optics uses high performance horizontal mount to deliver laser beam throughout a measurement system. The 8 flexure feet are designed for stable beam pointing.
