Thin Film
layer of material ranging < a nanometer to > a micrometer in thickness.
See Also: Film, Ellipsometers
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Thin-Film Thickness Measurement Systems
The Filmetrics® range of affordable reflectometers deliver high-precision thin-film thickness measurements in seconds. These easy-to-use tools, combined with intelligent software and a broad range of accessories and configurations, provide maximum versatility in film thickness measurements ranging from 1nm to 3mm.
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Ozone Gas Delivery Systems
MKS ozone gas delivery systems provide field-proven, high concentration, ultra-clean ozone generation for advanced thin film applications such as Atomic Layer Deposition (ALD), Chemical Vapor Deposition (CVD), Tetraethyl Orthosilicate (TEOS)/Ozone CVD (HDSACVD), contaminant removal and oxide growth. Gas delivery models have integrated ozone concentration monitoring, flow control, and power distribution. Additional system options include safety monitoring, status indicators and ozone destruction capability.
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XPS/ESCA Service
X-ray Photoelectron Spectroscopy (XPS Analysis), also known as Electron Spectroscopy for Chemical Analysis (ESCA), is used to determine quantitative atomic composition and chemistry. It is a surface analysis technique with a sampling volume that extends from the surface to a depth of approximately 50-70 Angstroms. Alternatively, XPS analysis can be utilized for X-ray Photoelectron Spectroscopy (XPS) or Electron Spectroscopy for Chemical Analysis (ESCA) from Evans Analytical Group (EAG).sputter depth profiling to characterize thin films by quantifying matrix-level elements as a function of depth.
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100GHz Dense Wavelength Division Multiplexer
DWDM-1000
Hangzhou Huatai Optic Tech. Co., Ltd.
DWDM series is based on mature thin film filtering technology and adopt metal sealing technology to encapsulate. It has the feature of flat channel bandwidth, flexible channel configuration, low insert loss and high isolation. The flexibility of channel configuration and modularized design make it convenient for system upgrading and expanding. All the Huatai products have no epoxy glue in optical line and can be used in high power optical communication system.
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Reference Ellipsometer for Thin Film Measurements
UVISEL Plus
The UVISEL Plus ellipsometer range offers the best combination of modularity and performance for advanced thin film, surface and interface characterization. FastAcq technology enables a sample measurement from 190 to 2100nm to be completed within 3 minutes, at high resolution. The possibility to continuously adjust the spectral resolution along the measurement range enables to scan a sample smarter and faster.
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Hybrid Amplifiers
Limiting
Macom Technology Solutions Holdings Inc.
MACOM offers a complete line of RF and microwave limiting amplifiers. Our limiting amplifiers use the latest thin film hybrid manufacturing techniques to obtain the highest level of performance, repeatability, and reliability. MACOMs portfolio of amplifiers range from 10 MHz to 4 GHz and are ideally suited for hi-reliability and mission critical applications.
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Thin Film Based Thermopile Detector: 4 Channels
2M Quad
A four-channel thin-film thermopile in a TO-8 package. Each active area is 2mm x 2mm. Offers the world's highest 4-channel sensitivity with exceptional signal-to-noise performance in a TO-8 package. Internal aperture minimizes channel-to-channel crosstalk while increasing sensitivity.
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1x2 CWDM Device(3 Ports)
Flyin Optronics’ Coarse wavelength division multiplexer (CWDM) utilizes thin film coating technology and proprietary design of non-flux metal bonding micro optics packaging. It provideslow insertion loss, high channel isolation, wide pass band, low temperature sensitivity and epoxy free optical path .
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C-Band / L-Band MWDM
WD1615/C, WD1516/L
Hangzhou Huatai Optic Tech. Co., Ltd.
WD1615/C, WD1516/L WDM is based on mature thin film filtering tech, with wide bandwidth, flatness, low insertion loss and high isolation. It is mainly applied to EDFA and DWDM network to achieve the combination and separation of C-Band and L-Band.
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Thin Film/Metal Film Chip SMD Chip Resistors
Panasonic Industrial Devices Sales Company of America
Panasonic’s industry leading Thin-Film Chip Resistors features include high reliability at high temperature and high humidity as well as high accuracy, low current noise and excellent linearity. Panasonic’s High Precision Thin Film Resistors are designed for robust applications where long life is crucial in markets such as automotive, appliance or industrial. These Resistors boast a high accuracy of up to 10ppm, 0.05% making them one of the best-in-class Resistors on the market today. Panasonic Thin-Film Resistors are available in case sizes down to 0201. Compliant standards include: IEC 60115-8, JIS C 5201-8, and EIAJ RC-2133B. These Resistors are AEC-Q200 Certified.
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RF Power Generators
MKS RF Power Generators provide reliable solid state power for thin films processing equipment. They are vital components of semiconductor fabrication systems, which produce the integrated circuits (ICs) or chips required by modern computers and electronic equipment. MKS RF Generators, combined with our Impedance Matching Network and our V/I Probe form a complete RF Delivery System.
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Flashlight Solar Simulator
Flashlight Solar Simulators have the advantage of negligible temperature change to the solar cell. For this reason, they are primarily used in cell and module production environments. Also, they are a more budgetary alternative if large cell areas are to be illuminated, because it is easier to have excellent light uniformity on areas of 8 in x 8 in or larger. So, this type of solar simulator is also used for analysis of large area thin film solar cells. But care must be taken, as some materials (e.g. CIGS) have long inherent time constants, so that the pulse length (better: flash plateau) must be chosen accordingly.
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Thin Film Analyser
TFA
The TFA instrument has be designed to monitor dissolution rates with a minimal volume of developer, typically ≤ 1 ml. The design uses surface tension to hold the developer in a small gap between the sample and the detector head. The instrument allows multiple measurements on the same sample. Thickness measurement can be made in the same geometry as dissolution measurements.
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Micro-spot DUV Reflection and Transmission Spectrophotometry
FilmTek 3000 PAR
Scientific Computing International
Metrology system with a 50µm spot that delivers high-performance transmission and reflection measurement of patterned films deposited on transparent substrates. Ideally suited for measuring the thickness and optical constants of very thin absorbing films.
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ALD Knowledge Center
As one of the first companies to market with a flexible commercially available atomic layer deposition system (ALD), we have a tremendous ALD Knowledge Center for researchers to draw upon. We have gathered together a wide range of information about ALD applications and thin films technology. This includes images and explanations of the exciting uses for ALD. We also gather and provide access to theses on the subject and a searchable database of scientific abstracts.
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In Situ Diagnostics
For researchers working on ultra thin films and novel interfaces, Neocera offers insitu, real-time process control and diagnostic tools such as high-pressure RHEED, Low Angle X-ray Spectroscopy (LAXS) and Ion Energy Spectroscopy (IES). RHEED provides exceptional growth control via RHEED intensity oscillations and the Structural data via diffraction. LAXS is a complimentary to RHEED and provides real-time Compositional information. IES provides energetics of the laser generated plasma plume which is directly responsible for obtaining high quality films and interfaces.
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Vacuum Process And Chamber Environment Monitors
Our process monitors are innovative in-situ process monitoring instruments that are fully integrated, application-specific packages, including component residual gas analyzers (RGAs), analytical equipment, and control software. Process mass spectrometers are used in varied applications, including; Semiconductor, Thin Film (CVD, Etch, PVD and degas), pharmaceutical lyophylization and bulk gas purity monitoring.
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Pure Boron Foils
MICROMATTER™ boron foils are also produced by laser plasma ablation; however, the deposition process is much more complex and time consuming than that for diamond-like carbon. Accordingly, only thin films, mainly designed for beam stripping of heavy ions in electrostatic accelerators, are available. All films are generally delivered on glass substrates coated with a release agent.
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FWDM Module
Flyin Optronics' Micro-Optical WDM utilizes thin film coating technology and proprietary design of non-flux metal bonding micro optics packaging. It provides low insertion loss, high channel isolation, low temperature sensitivity and epoxy free optical path.
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3 Ports FWDM（980/1550,1480/1550nm）
Flyin optronics' Micro-Optics WDM utilizes thin film coating technology and proprietary design of non-flux metal bonding micro optics packaging. It provides low insertion loss, high channel isolation, low temperature sensitivity and epoxy free optical path.
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Scanning Auger Nanoprobe
PHI 710
The PHI 710 Scanning Auger Nanoprobe is a unique, high performance Auger Electron Spectroscopy AES instrument that provides elemental and chemical state information from sample surfaces and nano-scale features, thin films, and interfaces. Designed as a high performance Auger, the PHI 710 provides the superior Auger imaging performance, spatial resolution, sensitivity, and the spectral energy resolution needed to address your most demanding AES applications.
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40-CH 100G Athermal AWG
Athermal AWG(AAWG) have equivalent performance to standard Thermal AWG(TAWG) but require no electrical power for stabilization. They can be used as direct replacements for Thin Film Filters(Filter type DWDM module) for cases where no power is available, also suitable for outdoor applications over -30 to +70 degree in access networks. Flyin’s Athermal AWG(AAWG) provide excellent optical performance, high reliability, ease of fiber handling and power saving solution in a compact package. Different input and output fibers, such as SM fibers, MM fibers and PM fiber can be selected to meet different applications. We can also offer different product packages, inluding special metal box and 19” 1U rackmount.
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PED Systems
Pulsed Electron Deposition
Is a process in which a pulsed (80-100 ns) high power electron beam (~1000 A, 15 kV) penetrates approximately 1 μm into the target resulting in a rapid evaporation of target material. The non-equilibrium heating of the target facilitates stoichiometric ablation of the target material. Under optimum conditions, the target stoichiometry is preserved in the deposited films. All solid state materials – metals, semiconductors and insulators, including those transparent to laser wavelengths in PLD – can be deposited as thin films with PED. By combining PLD and PED, the range of complex materials that can be prepared as thin films can be greatly enhanced.
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Dynamic Ultra Micro Hardness Tester
DUH-210/DUH-210S
A new evaluation system for measuring the material strength of micro regions, such as semiconductors, LSI, ceramics, hard disks, vapor deposited films, and thin coating layers, not addressed by previous hardness testers. It can also be used to evaluate the hardness of plastics and rubbers. This instrument uniquely measures dynamic indentation depth, not the indentation after the test. This in turn permits measurement of very thin films and surface (treatment) layers that are impossible to measure with conventional methods. Additionally, this same method supplies the data needed to calculate elastic modulus on the test specimens.
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GHW Series 13.56 MHz, 1.25, 2.5, And 5.0 KW High-Reliability RF Plasma Generators
The GHW Series RF power generators deliver maximum rated output powers of 1250, 2500 and 5000 Watts at a frequency of 13.56 MHz. The GHW generators offer field-proven reliability, exceptional stability, and unsurpassed repeatability for high uptime and process yield. They are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
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Deposition Systems
When a thin film requires the most stringent structural or compositional properties consistently across every layer, Veeco’s Ion Beam Deposition (IBD) technology is often the answer. Using a focused beam of ions to sputter material from a target, this physical vapor deposition technique builds dense, uniform films with standout adhesion and stability.
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C-Band 1510nm BWDM
WD1510
Hangzhou Huatai Optic Tech. Co., Ltd.
WD1510 WDM is based on mature thin film filtering tech, with wide bandwidth, flatness, low insertion loss and high isolation. It is mainly applied to WDM network to achieve the combination and separation of C-Band 1510nm (±10nm, monitor and control channel).
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X-ray Fluorescence Measuring System
FISCHERSCOPE X-RAY 5000
Inline measuring with highest precision for thin films. Robust XRF instrument for measuring and analyzing thin films and layer systems in the running process with connection to the production control system.
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Metrology System
IMPULSE V
With tighter wafer-to-wafer and within-wafer uniformity tolerances, integrated metrology systems are in use across various semiconductor processing steps. Based on demonstrated high-resolution optical technology, the IMPULSE V system provides higher sensitivity to thin film residue measurements during the CMP process. The IMPULSE platform boasts the industry’s most reliable hardware with best-in-class reliability and productivity metrics.
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Microwave Dielectric Measurement Systems
This system enables fast and non-destructive measurements of materials having various shapes, including thin films. Enables fast and non-destructive measurement of permittivity of thin-films and various dielectric materials using the evanescent mode of an open coaxial resonator.
