Mask
screens a surface or a signal to a certain shape.
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Product
DUV Mask Aligner
Model 200E
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OAI’S Model 200E DUV Mask Aligner performs all the functions of the tabletop Model 200 Mask Aligner but utilizes a 185nm Excimer Lamp as the UV light source. It is used for Biotechnology Processing.
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Product
Mask Produce and Test Machine
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LISUN produce the bfe tester for face mask, pfe tester, melt-blown cloth electrostatic electret generator according to ASTM F1862-17, ASTM F2299-03 (2017), ASTM F2100-2019, BS EN14683-2019, BS EN 14387-2004+A1 2008, BS EN 136-1998, BS EN 140-1999, BS EN 143-2000 +C1-A1, BS EN 149-2001+A1
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Product
MASK MVM-SEM® E3600 Series
E3650
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Amid the progress of multiple-exposure technology, and the development of finer-pitch and more complicated circuits, as well as increases in the number of masks and the number of measurement points on each mask, the size of wiring patterns formed on photomasks needs to be measured and evaluated stably with high precision. Advantest’s E3600 series meets the needs of state-of-the-art devices with high measurement repeatability and stable throughput.
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Product
Mask Foreign Matter Inspection Device
PR-PD2HR
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Efficient foreign matter inspection and measurement with high yield.
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Product
Front & Backside, Semi-Automatic Mask Aligner
Model 800E
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The OAI Model 800E front and backside, semi-automatic mask aligner system offers advanced features and specifications found most often in costly automated production mask aligners. With the development of this mask aligner, OAI meets the growing challenge of the dynamic semiconductor and MEMS market with a new class of mask aligners that are engineered for R&D and low volume production.
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Product
MASK DR-SEM
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Our defect review SEM tools perform detailed reviews of minute defects on photomasks.
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Product
Tabletop Front & Backside Mask Aligner
Model 200IR
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The OAI Model 200IR Mask Aligner is a tabletop system that requires minimal clean room space. It is a cost-effective alternative for R&D or limited scale, pilot production. Utilizing an innovative, air bearing / vacuum chuck leveling system, the substrate is leveled quickly and gently, for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The Model 200IR Mask Aligner is capable of one micron resolution and alignment precision. It has an alignment module which features mask insert sets and quick-change wafer chucks that enable the use of a variety of substrates and masks without requiring tools for reconfiguration. The alignment module incorporates micrometers for X, Y, and z-axis.
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Product
MASK MVM-SEM® E3600 Series
E3640
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Ongoing semiconductor process shrinks are driving new demand for stable, highly precise measurement of pattern dimensions for photomask and wafer production. The E3640 satisfies these requirements with industry-leading precision measurement capabilities and upgraded functionality that enhances mask R&D and production efficiency.
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Product
Mask Alignment Systems
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EVG’s inventions, such as the world’s first bottom-side alignment system in 1985, have pioneered and set the industry standards in both top and double-sided lithography, aligned wafer bonding and nanoimprint lithography. EVG contributes in these areas through continuous development of mask aligner product generations to augment this core lithography technology.
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Product
NanoLattice Pitch Standard for Mask Handling Tools (NLSM)
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The NanoLattice™ (NLSM) 100 nm pitch standard utilizes gratings with near perfect periodicity to calibrate magnification and scan linearity of CD-SEM and Atomic Force Microscopes (AFM). Make the grade, with the only pitch standard of its kind available below the 130 nm node.
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Product
Automated Mask Aligner with Integrated Mask Changer
Model 6000A-MC
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The Model 6000A-MC is a precision system combining OAI’s Model 6000, Automated Production Mask Aligner, with an integrated mask changer. The mask changer can handle from 10 to 150 masks. Ideal for both semiconductor and bio-tech applications. It also is designed with a bar code reader to assure each mask is coordinated to the right process. Please contact OAI for further product information.
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Product
Reticle/Mask Particle Remover
RP-1
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The RP-1 automatically removes particles from the reticle/mask by air (or N2) and vacuum suction. Routinely removing the particles before the lithography process extends the replacement cycle of the pellicle and cleaning cycle of the mask, thereby contributing to a reduction in running costs.
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Product
Oscilloscope: 200 MHz, 2 Analog Channels
DSOX2022A
Oscilloscope
200 MHz2 analog channels Easily view your signals on the 8.5-inch WVGA display Capture more data with up to 1 Mpts memory See more signal detail with 50,000 wfms/s update rate Expand your measurement capabilities with full upgradability: Add digital channels, 20 MHz function generator, 3-digit voltmeter, serial trigger and analysis, segmented memory & mask testing at any time Easily set up teaching labs with our free Educator's Resource Kit
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Product
PXIe 200 MHz Oscilloscope
M9241A
Oscilloscope
200 MHz bandwidth oscilloscope2 analog channels5 GSa/s sample rate1,000,000 wfms/s update rate Isolate signals in seconds with exclusive zone triggering Additional options: 20 MHz arbitrary waveform generator, 3-digit voltmeter, serial trigger and analysis and mask testing
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Product
ARINC-style Attitude Gyroscopes
1U367-series
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The 1U367 has a pictorial horizon mask and a fixed airplane. The mask moves to indicate climb, dive, and bank. Bank and pitch attitudes are diaplayed so that the pilot's sensing of the gyro's horizon indication is the same as the interpretation of the relationship between the wings of the aircraft and the natural horizon during visual flight.
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Product
Mixed Signal Oscilloscope, 100 MHz, 2 Analog Plus 16 Digital Channels
MSOX3012A
Oscilloscope
100 MHz2 analog plus 16 digital channels Easily view your signals on the 8.5-inch WVGA display Capture more data with up to 4 Mpts memory See more signal detail with 1,000,000 wfms/s update rate Expand your measurement capabilities with full upgradability: Add bandwidth, memory, 20 MHz arbitrary waveform generator, 3-digit voltmeter, serial trigger and analysis, segmented memory & mask testing at any time
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Product
Advanced Node Solution
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A major new challenge at 20nm/14nm is the requirement for extra masks (double patterning technology, or DPT) to make existing lithography work at this advanced node. Read 20 questions on 20nm - a Q&A document.
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Product
Automated Front & Backside Mask Aligner System
Model 6000
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With over 4 decades of manufacturing in the semiconductor industry, OAI meets the growing challenge of a dynamic market with an elite class of production photolithography equipment. Built on the proven OAI modular platform, the Model 6000 has front and backside alignment that is fully automated with a submicron printing capability as well as submicron top to bottom front side alignment accuracy which delivers performance that is unmatched at any price. Choose either topside or optional backside alignment which uses OAI’s customized advanced recognition pattern software. These Mask Aligners have OAI’s Advanced Beam Optics with better than ±3% uniformity and a throughput of 200 wafers per hour in first mask mode, which results in higher yields. The Series 6000 can handle a wide variety of wafers from thick and bonded substrates (up to 7000 microns), warped wafers (up to 7 mm-10mm), thin substrates (down to 100 micron thick), and thick photo resist.
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Product
Oscilloscope - 350 MHz, 4 Analog Channels
DSOX4034A
Oscilloscope
350 MHz4 analog channels Easily view signals on the large 12.1-inch capacitive touch screen Isolate signals in seconds with exclusive Zone touch triggering Capture more data with 4 Mpts memory and standard segmented memory See more signal detail with 1,000,000 wfms/s update rate Expand your measurement capabilities with full upgradability: Add bandwidth, digital channels, dual-ch 20 MHz arbitrary Wave Gen, 3-digit DVM, serial trigger and analysis & mask testing
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Product
Oscilloscope: 100 MHz, 4 Analog Channels
DSOX2014A
Oscilloscope
100 MHz4 analog channels Easily view your signals on the 8.5-inch WVGA display Capture more data with up to 1 Mpts memory See more signal detail with 50,000 wfms/s update rate Expand your measurement capabilities with full upgradability: Add digital channels, 20 MHz function generator, 3-digit voltmeter, serial trigger and analysis, segmented memory & mask testing at any time Easily set up teaching labs with our free Educator's Resource Kit
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Product
ULTRA Semiconductor Mask Writer
ULTRA
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The ULTRA Semiconductor Mask Writer is a cutting-edge solution designed to meet the demanding requirements of today's semiconductor manufacturing processes. Building on advanced technology from Heidelberg Instruments, this mask writer excels in producing high-precision photomasks essential for microcontrollers, power management ICs, LEDs, IoT devices, photonics, and MEMS. Its high throughput and cost-effective operation significantly enhance yield and profitability, making it an invaluable asset for semiconductor production.
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Product
RF Analyzer
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Occupied Bandwidth (OBW)Adjacent Channel Power (ACP)Channel Power (CHP)Complementary Cumulative Density Function (CCDF) Intermodulation (IMD)Spectrum Emission Mask (SEM) IQ (Waveform)Phase Noise
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Product
T9731 High-performance Flow Test instrument with continuous measurement for EN 14683
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The T9731 is specifically designed for measure the adequate air flow rate in complete adherence to the standard EN 14683 for surgical masks testing.Full scale from 10 mbar to 10,000 cc/minFlow measurement accuracy : 1% RDG + 0.1% FSFlow measurement resolution : 1 cc/minDirect pressure accuracy : 0,5% RDG + 3 DGTDirect pressure resolution : 0.001 mbar (0.1 Pa)
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Product
32 Channel Analog Comparator Module
DP-VXI-5106
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DP-VXI-5106, is a 32 Channel Analog Comparator Module with 32 channels of differential analog window comparators. Each channel is provided with a window comparator as well as a Level Comparator , software selectable on an independent channel basis. All the 32 channels have been grouped into four groups of 8 channels each. This allows the user to configure the comparator module based on the application to initiate alarm action to exactly meet application requirements. Each Comparator channel can be programmed to generate a VXI bus interrupt or can be masked through software. An Interrupt is generated on an individual channel basis or on a group basis. Front panel outputs of buffered TTL and a 2-CO relay contact is available for every group (4 outputs total each). Also, a common buffered TTL interrupt output and a common 2-CO relay contact is also available at the facia providing extensive flexibility in application engineering.This module is an ideal device for GO / NO-GO testing in Test Stand Automation where important signals must be continuously monitored for system shut down purposes and safety inter-lock implementation. The hardware implementation in the Comparator module provides high-speed throughput and reliable inter-lock implementation. The interrupt out signal can be further wired as trigger signals for pre and post trigger analysis of signal data for post acquisition detailing.Each channel provides a Window Comparator implementation and a Level Comparator implementation. The configuration is programmable through software and the alarm can be generated if the signal is within the window or outside the window. Similarly, a high and low limit can be set and a trigger is generated if the signal exceeds the high limit or drops below the low limit.
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Product
Hand-held Radioisotope Identification Device
RadEAGLET
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Combining a large, high sensitivity crystal with a proven and tested intelligent algorithm, the RADEAGLET can quickly, accurately, and simultaneously detect and identify up to six isotopes, typically in under 30 seconds. The RADEAGLET performs well, even in complex shielded or masked scenarios. ANSI 42.34 compliant, the RADEAGLET offers a user-friendly interface that is intuitive, simple to navigate, provides visually clarity, and utilizes an extensive array of alarms. Supports NaI(Tl) and LaBr3(Ce) to optimize performance across multiple applications.
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Product
Machine Vision Camera
Mako
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Mako cameras feature the latest CMOS sensor technologies from renowned manufacturers (Sony, CMOSIS, e2V, Aptina, OnSemi Python). Always get the best image quality for your application with a choice of camera models from VGA to 5 megapixel resolution, and frame rates up to 550 fps. Choose between two plug-and-play interfaces (GigE VisionTM or USB3 VisionTM) for an easy integration into standard image processing systems. Mako camera offer advanced features including camera temperature monitoring, pixel defect masking, separate ROI for auto features for all your application requirements.
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Product
Transport Expert
TX Series
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The VeEX® TX product series offers a complete test solution for Next Generation of Transport, Metro and Carrier Ethernet Testing. Color graphical display assisted with touch panel enables users tapping through the test configuration and accessing complex overhead bits and bytes. Features include APS, TDM, pointer adjustment, pulse mask analysis, G.821/G.826/M.2100, histogram, and overhead access.
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Product
Enhanced Time Domain Analysis With TDR
S96011B
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Use S96011B to perform enhanced time domain analysis for high-speed data applications. Includes all functionality of the S96010B (TDR/TDT mode). In addition, the S96011B enables more detailed measurements and evaluations, such as eye diagram / mask modes, without adding PLTS software. Jitter and emphasis / equalization capabilities enable simulation of real-world signals and environment. The S96011B covers up to 53 GHz bandwidth. Full calibration is available and the automatic deskew ensures easy removal of fixture and probe effects. To get the best accuracy, use mechanical calibration kits or ECal with DC option (i.e. N469xD or N4433D with Option 0DC).
