Metrology
field of measurement.
See Also: Measurement, Instrumentation, Coordinate Measuring Machines
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Product
330 System
NSX
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With a combination of inspection plus metrology, NSX 330 System measures multiple applications including wafer-level metrology for micro bumps, RDL, kerf, overlay, and through silicon via (TSV) in a single wafer load.
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Product
Compact General-Purpose Metrology System
Benchmark 250
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The Benchmark 250 is a compact general-purpose metrology system with all the features and capabilities of the larger VIEW Micro-Metrology models. With travel of 300 x 150 x 150 mm, the Benchmark can accommodate a wide range of part sizes, and is rugged enough to be located in either a Q/A lab or an inspection station on the production floor.
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Product
kSA RateRat Pro
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kSA RateRat Pro is a compact, convenient and easy-to-use optical metrology tool for thin-film characterization. Its unique capability is to measure, in situ and in real-time, optical constants (n and k), deposition rate and film thickness.
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Product
Scatterometers/ Thin Film Metrology Systems
LittleFoot Series
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The n&k LittleFoot-CD, and LittleFoot-CD450 are DUV-Vis-NIR scatterometers/thin film metrology systems, based on polarized reflectance measurements (Rs and Rp) from 190nm to 1000nm, with microspot technology. The systems in the LittleFoot-CD Series determine thickness, n and k spectra from 190nm-1000nm of thin films, as well as depths, CDs, and profiles of trenches and contact holes.
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Product
EFEM Platform
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Our EFEM Platform can act as a standard EFEM, or can be customized to suit your application’s cleanliness, handling technique, throughput, and form-factor requirements. From design to manufacturing, we offer units in varying complexity and precision and can integrate the needed hardware, software, vision, optics design, sub-micron metrology, environmental control and materials handling to fit your needs from single units to 4-wide.
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Product
Horizontal Arm CMMs
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As a system provider, ZEISS offers just the solutions for the changing conditions of day-to-day measuring tasks with impressive accuracy, effectiveness, and above all, dependability. From the first consultation on the installation, to the maintenance of your measuring machines, ZEISS takes charge of your metrology. You get all the services and products from the same partner – and all optimally matched to each other.
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Product
DUV-NIR Spectroscopic Reflectometry
FilmTek 2000
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Scientific Computing International
Automated metrology system designed for rapid, reliable, and accurate characterization of nearly any unpatterned thin film. Fully user-customizable wafer mapping capabilities rapidly generate 2D and 3D data maps of any measured parameter. Capable of simultaneous determination of multiple film characteristics within a fraction of a second per site.
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Product
Coordinate Measuring Machines
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The LK Metrology range of Coordinate Measuring Machines represent the ultimate in CMM technology. Designed and manufactured using only the highest quality materials, they carry a heritage of over 55 years experience and expertise. LK CMMs deliver the ability to perform dimensional, positional and surface measurement in a single system.
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Product
Thin Film Metrology Systems
Gemini Series
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The n&k Gemini-TF, Gemini-TF-M and Gemini-FPD are specifically designed for measurements of patterned and unpatterned films on transparent or opaque substrates. These tools are used extensively for solar cell, flat panel and photomask applications. The tools belonging to the Gemini-TF Series are based on unpolarized Reflectance (R) and unpolarized Transmittance (T) measurements, with a 50μm spot size for both R and T. R and T are simultaneously measured to determine film thickness and n and k spectra from 190nm – 1000nm
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Product
Automated Surface Inspection for Glossy Components
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Flawlessly glossy surfaces are among the most important quality features of many premium products. The smallest surface defects immediately have a degrading effect on the product. The result: disappointed end customers or buyers. At the same time, reflective surfaces are often very sensitive and a challenge for optical metrology. A manual inspection is tedious, expensive, and ultimately always governed by subjective decision criteria. During production, faulty painting or coating processes can cause high scrap rates. Defects that are not detected even during the final inspection can lead to expensive complaints and, in the worst case, to the loss of the customer. Only an efficient, automated surface inspection achieves the highest quality at acceptable costs.
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Product
TE-Metrology
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HIGHVOLT Prüftechnik Dresden GmbH
The TE measurement complements the high voltage test and is part of the routine and type testing of numerous electrical devices. It is one of the most important non-destructive methods for detecting faults in electrical installations. The breakdown of an insulating material usually occurs at an internal weak point, which usually already shows a partial discharge activity in advance. For this reason, measuring partial discharges can help prevent costly damage. The TE measurement is thus used for quality testing and diagnosis in the factory as well as during on-site testing of cables, GIS, power transformers and transducers or rotating machinery and their components
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Product
Automated Metrology System
EVG®50
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High-throughput, high-resolution metrology for bonded stacks and single wafers. The EVG 50 (fully automated stand-alone tool) and the Inline Metrology Module (integrated in EVG''s high-volume manufacturing systems) offer highly accurate measurements at high speed, utilizing different measurement methods for a large number of applications. The tool''s application range covers multi-layer thickness measurements for determination of the total thickness variation (TTV) of an intermediate layer, the inspection of bond interfaces as well as resist thickness measurement, and meets the most demanding requirements of the yield-driven semiconductor industry.
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Product
Stand alone Software
MeX
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MeX is a stand alone software package that turns any SEM with digital imaging into a true surface metrology device. Using stereoscopic images the software automatically retrieves 3D information and presents a highly accurate, robust and dense 3D dataset which is then used to perform traceable metrology examination. The results are obtained irrespective of the SEM magnification providing metrology at macro and micro levels. No additional hardware is necessary to run MeX and it can be used with any SEM. Due to the unique AutoCalibration routine the calibration data is automatically refined. Thereby only MeX enables traceable 3D measurements at any magnification in the SEM.
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Product
3D Scanning Software
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Software is a comprehensive component to any advanced metrology system. Combined with laptops and portable equipment, 3D scanning and measurement is now possible virtually anywhere. 3D scanner software plays a critical role in every stage from the creation of a concept design to the manufacturing and inspection of prototypes. Below is a look at some of the Laser Scanner Software and 3D Scanner Software providers and platforms we represent and handle.
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Product
Adapter, 2.4 mm (m) to 2.4 mm (f), DC to 50 GHz
11900C
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The Keysight 11900C is a metrology grade, 2.4 mm male to 2.4 mm female adapter with dc to 50 GHz operation.
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Product
Surface Measurement Instrument
SMI
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Redefining speed and accuracy in non-contact metrology, the Optikos SMI is a high-speed surface topography instrument that characterizes spherical, toric, and aspheric surfaces. The SMI measures surface shape deviations of precision surfaces using wavefront analysis technology. Configured to measure such items as: micro-optics, ball lenses, and contact lens molds, the instrument allows users to easily measure aspheric and toric parts without the need for reference surfaces.
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Product
Metrology Systems
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VIEW offers a full line of optical metrology systems for wafer, photomask, slider, MEMS, semiconductor package, HDD suspension, probe card, and micro-component process measurements.
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Product
WAFERMAP
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WAFERMAP is an award winning software package used to collect, edit, analyze and visualize measured physical parameters on semiconductor wafers. WAFERMAP can import data files from various metrology tools such as ellipsometers, thickness gauges and four point probes. The imported data can then be visualized or printed as line scans, contour plots, 2D or 3D plots or as a histogram.
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Product
Hi Rate Multi-Pixel Detection
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Systems utilizing multiple electron beams are an emerging semiconductor metrology technology that aims to increase throughput. El-Mul is a pioneer in developing detection solutions for such metrology systems and has designed and manufactured prototype detectors that can simultaneously detect 144 beams at 35MHz.
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Product
Particle Deposition Systems
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MSP’s 2300G3 Particle Deposition System sets the standards for wafer inspection and metrology equipment. This advanced tool is vital for increasing the yield of future leading-edge devices, while meeting the measurement needs of today.
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Product
Chilled Mirror Hygrometers
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We are internationally recognized as a leading developer and manufacturer of the high-quality MBW Calibration chilled mirror dew point hygrometers used in a variety of humidity calibration, measurement and gas quality applications. Most notably, our MBW instruments provide the calibration traceability for many laboratories such as humidity instrument manufacturers and National Metrology Institutes. Our MBW chilled dew point mirrors continue to be chosen as transfer standards for inter-laboratory comparisons both regionally and internationally.
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Product
Programming
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You are looking for a LabVIEW-solution for a test problem? LabVIEW is an excellent development environment for all areas of metrology. Here we have extensive experience and can help in your test problems. In the LabVIEW programming language, we develop VIs (Virtual Instruments) that can be integrated easily in TestStand. Using hardware-oriented programming languages such as C# and LabVIEW, we develop integrations of control and measurement components.
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Product
High Precision 3D Metrology
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Ensure zero-defect quality in all product deliveries and boost customer satisfaction: ISRA’s precision metrology systems measure all object and surface properties down to the nanometer level while ensuring the shortest cycle times.
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Product
Metrology Equipment
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Exact Metrology sells, services and implements metrology equipment from the 3D scanning industry's leading manufacturers. Our highly trained team can configure our comprehensive lineup of portable CMMs, 3D scanners, 3D laser scanners and 3D metrology equipment & digitization equipment and software for practically any application.You'd have to scan far and wide to find a more inclusive selection of 3D metrology equipment. We sell everything from Faro arms to 3D body scanners; white light scanners to blue light scanners; coordinate measuring machines to desktop 3D scanners.
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Product
CALIBRATION LABORATORY
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Micro Precision Calibration Inc.
Environmentally controlled facilities to ensure high quality and accurate calibrations and measurements.Direction by a Professional Engineer registered in Metrology by the State of California.Professionally trained technicians in electronic and mechanical calibration.Quick turnaround by a full staff -- from sales to service.Full custom database for data sheets, history, invoices, and computerized recall for upcoming due date.Service by all major carriers, with our own pick-up and delivery in some areas.Customers include over 10,000 companies globally.Technical support for ISO, MIL standards, and database set-up.Calibration Labs are located in the USA, Southeast Asia and Middle East.
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Product
Solar Photovoltaic
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Scientific Computing International
Automated metrology system designed for rapid, reliable, and accurate characterization of nearly any unpatterned thin film.
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Product
Deep Ultraviolet Spectrophotometer System
VUVAS-10X
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A new ultraviolet spectrophotometer system for optical metrology just arrived at NASA Goddard! The VUVAS-10X spectrophotometer works best in the 90 to 160 nanometer wavelength range, also known as deep or vacuum ultraviolet (VUV) region. It uses a windowless hydrogen plasma light source and differential pump section to reach many wavelengths beyond those of conventional deuterium lamps. The source also works with other gases, or gas mixtures, for atomic spectral line emission from about 30 nanometers (double ionized Helium gas) up to the Visible light range. The new spectrophotometer system, McPherson VUVAS-10X, uses a one-meter focal length high-resolution monochromator with the special light source, scintillated detector and Model 121 goniometric sample chamber. The system is ideal for optical transmission, absorbance and specular reflectance at incident angles up to 60 degrees. This McPherson spectrophotometer system will help develop, inspect and qualify optical materials and coatings used for very high altitude and extraterrestrial space flight missions.
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Product
Photovoltaic/Solar Metrology System
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Multi-channel thickness, TTV and bow measurement module for in-process monitoring of solar/photovoltaic wafers and other materials.
